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HYDROGEN PEROXIDE 5L - 44438-0050
PERRHENIC(VII)ACID 5GR - AC31618-0050
HYDROGEN PEROXIDE FOR ANALYS 35WT% 2.5L - 20246-0025
Nitric Acid 30% V/V In Methanol 1L Glass. Nitric Acid, 30% v/v in Methanol, Cas number: 7697-37-2, 67-56-1, 7732-18-5, Molecular Formula: HNO3, CH3OH, H2O, Molecular weight: 63.01g/mol, 32.04 g/mol, 18.01g/mol, Appearance/Form: Colorless liquid, Size: 1L glass
Nitric Acid 30% V/V-Methanol 1L Poly natural. Nitric Acid, 30% v/v in Methanol, Cas number: 7697-37-2, 67-56-1, 7732-18-5, Molecular Formula: HNO3, CH3OH, H2O, Molecular weight: 63.01g/mol, 32.04 g/mol, 18.01g/mol, Appearance/Form: Colorless liquid, Size: 1L Poly natural
WATER 0.1% TFA 4L.
HYDROFLUORIC FINYTE 47-51% 4L CS4 - S050504-APNH43
N,N-Dimethylacetamide. CAS RN 127-19-5. DriSolv, 99.8% min. by GC. Appearance Clear, free from particulates; Color (APHA): 10 max.; Residue after Evaporation: 10 ppm max.; Water: 50 ppm max. Suitable for organic synthesis and anhydrous solvent applications. Packaged in a septum-sealed bottle.1L.
Bromine For Synthesis.
Acetamide for Synthesis. Cas Number 60-35-5 1Kg
Chlorotriphenylmethane For Synthesis.
2-Naphthol for Synthesis. Cas Number 135-19-3 250G
2-Pentanol For Synthesis.
Isoamyl alcohol. Emplura Isoamyl alcohol (mixture of isomers), Cas number: 30899-19-5, Solvent for lab application, 2500ml.
Ethyl nonanoate for synthesis, Cas Number: 123-29-5, Synonyms: Nonanoic acid ethyl ester, Ethyl pelargonate, Pelargonic acid ethyl ester, Chemical formula: CH3(CH2)7COOC2H5.
Methyl Trifluoromethanesulfonate for Synthesis 10Ml.
2, 2, 2-Trichloroethanol for synthesis, CAS number 115-20-8, Chemical formula CCl3CH2OH, Synonyms B, B, B-Trichloroethyl alcohol
1,3,5-Tris(2-Hydroxyethyl)Cyanuric Acid for Synthesis 250G.
4-Chloro-3-Methylphenol for Synthesis. Cas Number:59-50-7 5G
2-Thiobarbituric Acid Reagent For Sorbic Acid.
Thioglycolic Acid Gr For Analysis Reag. Ph Eur.
Sulfanilic Acid Gr For Analysis Acs,Reag. Ph Eur.
Sulfanilic Acid Gr For Analysis Acs,Reag. Ph Eur.
Rubeanic Acid Gr For Analysis.
Hydrogen Peroxide, Stabilized Solution 3% (w/w) 500 mL.
Sulfuric Acid, 96%, ACS/FCC. H2SO4, weight 98.08, CAS 7664-93-9, density 1.835 kg/L, 19L poly carboy.
Sulfuric Acid, 96%, ACS/FCC. H2SO4, weight 98.08, CAS 7664-93-9, density 1.835 kg/L, 3.8L poly bottle.
Hydrogen peroxide. Grade: 35% w/w aq. soln. . Melting Point Cca -24. Boiling Point C: NA. H2O2. 7722-84-1. OXIDISING CORROSIVE
Hydrogen peroxide. Grade: 27% w/w aq. soln. . Melting Point C-23. Boiling Point C: 107. H2O2. 7722-84-1. OXIDISING CORROSIVE
Sulfuric acid. 10% v/v Aqueous Solution,UN2796,Liquid,DANGER: CORROSIVE, burns skin and eyes,1L.CORROSIVE,
Hydrogen peroxide. ACS, 29.0-32.0%,UN2014,Liquid (Stablized),DANGER: OXIDIZER, burns skin and eyes,500ml,4x500ml,OXIDIZER,CORROSIVE
Hydrogen peroxide. ACS, 29.0-32.0%,UN2014,Liquid (Stablized),DANGER: OXIDIZER, burns skin and eyes,500ml,4x500ml,OXIDIZER,CORROSIVE
Hydrogen peroxide. ACS, 29.0-32.0%,UN2014,Liquid (Stablized),DANGER: OXIDIZER, burns skin and eyes,500ml,4x500ml,OXIDIZER,CORROSIVE
HYDROCHLORIC ACID. REAGENT ACS - 5100-6G250C
Hydrogen Peroxide. (H2O2). Liquid. 30% solution, stabilized. Induces apoptosis in cultured rat cortical neurons. RTECS MX0899000, CAS 7722-84-1, M.W. 34.0. WARNING! Harmful. LD50 of
= 2000 mg/kg. May be carcinogenic/teratogenic.
Hydrogen Peroxide. (H2O2). Liquid. 30% solution, stabilized. Induces apoptosis in cultured rat cortical neurons. RTECS MX0899000, CAS 7722-84-1, M.W. 34.0. WARNING! Harmful. LD50 of
= 2000 mg/kg. May be carcinogenic/teratogenic.
SULFURIC ACID LM 96% SEMICOND/ELEC 55GAL - 1921-55GAL
26-DICHLORO-4-METHYL-BENZOIC ACID 5G - 21087-5G
4-(TERT-BUTYL)BENZENEBORONIC ACID 25G - OR10399-25G
4-(TERT-BUTYL)BENZENEBORONIC ACID 100G - OR10399-100G
Rpi Hepes Free Acid [N-(2-Hydroxyethyl) Piperazine N'-(2-Ethanesulfonic Acid)] 250G. RPI HEPES, Free Acid [N-(2-Hydroxyethyl) piperazine N'-(2-ethanesulfonic acid)], CAS: 7365-45-9,Appearance: White Crystalline Powder Assay (Titration, dried basis): 99.5 %, pH (5% in water): 5.0 - 6.5, Size: 250g
Siliabond Propylsulfonic Acid (SCX-2) 100G. Siliabond Propylsulfonic Acid (SCX-2) Silicagel, Endcapped, Shape: Irregular, Color: White powder, Purity:
/=99.95%, Particle Size: 40-63 um / 230-400 mesh, Pore size: 60 Angstrom, Application: Drug discovery laboratories, Size: 100G
Xylene Cleanroom LP -Amber Bottle, Formula: C8H10, It is used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions. 13lb
Sulfuric acid. Sulfuric Acid 96% Gigabit, Container: Poly Bottle, H2SO4, CAS number: 7664-93-9,used in Semiconductor Processing to remove residual organic contamination prior to metalization steps. 15lb
Isopropanol Gigabit, Poly bottle, Molecular formula C3H8O, Cas: 67-63-0,used to rinse silicon wafers and to leave a clean dry residue free surface usually after organic stripping solutions.1/Itm/Bx
Hydrogen Peroxide, 30%, Cleanroom LP, Cas: 7722-84-1, Formula: H2O2, used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination.
Hydrofluoric acid, 49%, Cleanroom Mb, Poly bottle, HF, CAS Number: 7664-39-3, critical chemistry in semiconductor processing. It is used to solubilize many oxides, particularly silicon dioxide, the most widely used insulator on semiconductor devices. 40lb
Hydrochloric Acid, 37% Polybottle, Formula: HCl, CAS Number: 7647-01-0,used in SC-2 solutions to remove surface metallic contamination from silicon wafers. 40lb
SULFURIC ACID REAGENT ACS 2500ML - 5300-6G250C, 2.5 L
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